| Type of Material: | Thesis |
| Title: | Studies on the performance of plasma treated tin oxide thick film gas sensors |
| Researcher: | Srivastava, Roopali |
| Department: | Department of Electronics Engineering |
| Publisher: | Banaras Hindu University |
| Place: | Varanasi |
| Year: | 1998 |
| Language: | English |
| Subject: | Thick film technology | Electronics |
| Accession No: | 934370%924371 |
| Dissertation/Thesis Note: | PhD |
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| 001 | 77090 | |
| 003 | IN-AhILN | |
| 005 | 2011-01-13 00:00:00 | |
| 008 | __ | 981231t1998||||ii#||||g|m||||||||||eng|| |
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| 040 | __ | |aBHUL_221005|dIN-AhILN |
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| 100 | __ | |aSrivastava, Roopali|eResearcher |
| 110 | __ | |aDepartment of Electronics Engineering|bBanaras Hindu University|dVaranasi|eIN |
| 245 | __ | |aStudies on the performance of plasma treated tin oxide thick film gas sensors |
| 260 | __ | |aVaranasi|bBanaras Hindu University|c1998 |
| 502 | __ | |bPhD |
| 653 | __ | |aThick film technology |
| 653 | __ | |aElectronics |
| 852 | __ | |p934370%924371 |
| 905 | __ | |anotification |
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