| Type of Material: | Thesis |
| Title: | Preparation and characterization of plasma enchanced chemical vapour deposited silicon dioxide and polyoxide films |
| Researcher: | Dixit, Bharat Bhushan |
| Guide: | Srivastava, C M |
| Department: | Department of Engineering |
| Publisher: | Indian Institute of Technology-Bombay |
| Place: | Mumbai |
| Year: | 1991 |
| Language: | English |
| Subject: | Engineering | Engineering Materials | Materials Science | Crystallography |
| Dissertation/Thesis Note: | PhD |
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| 001 | 6312 | |
| 003 | IN-AhILN | |
| 005 | 2011-01-13 00:00:00 | |
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| 040 | __ | |aIITB_400076|dIN-AhILN |
| 041 | __ | |aeng |
| 100 | __ | |aDixit, Bharat Bhushan|eResearcher |
| 110 | __ | |aDepartment of Engineering|bIndian Institute of Technology-Bombay|dMumbai|eIn |
| 245 | __ | |aPreparation and characterization of plasma enchanced chemical vapour deposited silicon dioxide and polyoxide films |
| 260 | __ | |aMumbai|bIndian Institute of Technology-Bombay|c1991 |
| 502 | __ | |bPhD |
| 653 | __ | |aEngineering |
| 653 | __ | |aEngineering Materials |
| 653 | __ | |aMaterials Science |
| 653 | __ | |aCrystallography |
| 700 | __ | |aSrivastava, C M|eGuide |
| 905 | __ | |anotification |
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