| Type of Material: | Thesis |
| Title: | Analytical model simulation of plasma immersion implantation process for semiconductor device fabrication |
| Researcher: | Gupta, Dushyant |
| Department: | Department of Electrical Science |
| Publisher: | Kurukshetra University |
| Place: | Kurukshetra |
| Year: | 2003 |
| Language: | English |
| Subject: | Engineering Science | Electronics Engineering |
| Accession No: | Vol 41 Issue 27 |
| Dissertation/Thesis Note: | PhD |
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| 110 | __ | |aDepartment of Electrical Science|bKurukshetra University|dKurukshetra|eIn |
| 245 | __ | |aAnalytical model simulation of plasma immersion implantation process for semiconductor device fabrication |
| 260 | __ | |aKurukshetra|bKurukshetra University|c2003 |
| 502 | __ | |bPhD |
| 653 | __ | |aEngineering Science |
| 653 | __ | |aElectronics Engineering |
| 852 | __ | |pVol 41 Issue 27 |
| 905 | __ | |anotification |
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