| Type of Material: | Thesis |
| Title: | Measurements of the jonization current growth and the ratio of diffusion coefficient to mobility for electrons in feebly attaching gases |
| Researcher: | Risbud, Ashok Vasant |
| Guide: | Naidu, M S |
| Department: | Department of High Voltage Engineering |
| Publisher: | Indian Institute of Science |
| Place: | Bangalore |
| Year: | 1979 |
| Language: | English |
| Subject: | Engineering | Electrical Engineering | Applied Electrochemistry |
| Dissertation/Thesis Note: | PhD |
| 000 | 00000ntm a2200000ua 4500 | |
| 001 | 43877 | |
| 003 | IN-AhILN | |
| 005 | 2011-01-13 00:00:00 | |
| 008 | __ | 791231t1979||||ii#||||g|m||||||||||eng|| |
| 035 | __ | |a(IN-AhILN)th_43877 |
| 040 | __ | |aIISC_560012|dIN-AhILN |
| 041 | __ | |aeng |
| 100 | __ | |aRisbud, Ashok Vasant|eResearcher |
| 110 | __ | |aDepartment of High Voltage Engineering|bIndian Institute of Science|dBangalore|eIn |
| 245 | __ | |aMeasurements of the jonization current growth and the ratio of diffusion coefficient to mobility for electrons in feebly attaching gases |
| 260 | __ | |aBangalore|bIndian Institute of Science|c1979 |
| 502 | __ | |bPhD |
| 653 | __ | |aEngineering |
| 653 | __ | |aElectrical Engineering |
| 653 | __ | |aApplied Electrochemistry |
| 700 | __ | |aNaidu, M S|eGuide |
| 905 | __ | |anotification |
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