| Type of Material: | Thesis |
| Title: | Simultaneous diffusion of boron and phosphorus into silicon for the fabrication of solar cells |
| Researcher: | Kotnala, Ravinder Kumar |
| Guide: | Chopra, K L |
| Department: | Department of Engineering |
| Publisher: | Indian Institute of Technology-Delhi |
| Place: | New Delhi |
| Year: | 1982 |
| Language: | English |
| Subject: | Engineering | Heat Engineering | Solar Energy Engineering |
| Dissertation/Thesis Note: | PhD |
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| 001 | 40331 | |
| 003 | IN-AhILN | |
| 005 | 2011-01-13 00:00:00 | |
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| 040 | __ | |aIITD_110016|dIN-AhILN |
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| 100 | __ | |aKotnala, Ravinder Kumar|eResearcher |
| 110 | __ | |aDepartment of Engineering|bIndian Institute of Technology-Delhi|dNew Delhi|eIn |
| 245 | __ | |aSimultaneous diffusion of boron and phosphorus into silicon for the fabrication of solar cells |
| 260 | __ | |aNew Delhi|bIndian Institute of Technology-Delhi|c1982 |
| 502 | __ | |bPhD |
| 653 | __ | |aEngineering |
| 653 | __ | |aHeat Engineering |
| 653 | __ | |aSolar Energy Engineering |
| 700 | __ | |aChopra, K L|eGuide |
| 905 | __ | |anotification |
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