| Type of Material: | Thesis |
| Title: | Deposition and characterization of high k dielectric thin films for mos capacitors |
| Researcher: | Khairnar, Anil Gulabrao |
| Guide: | Mahajan, A M |
| Publisher: | North Maharashtra University |
| Place: | Jalgaon |
| Language: | English |
| Dissertation/Thesis Note: | PhD |
| Fulltext: | Shodhganga |
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| 001 | 386618 | |
| 003 | IN-AhILN | |
| 005 | 2018-08-14 09:16:58 | |
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| 035 | __ | |a(IN-AhILN)th_386618 |
| 040 | __ | |aNMHR_425001|dIN-AhILN |
| 041 | __ | |aeng |
| 100 | __ | |aKhairnar, Anil Gulabrao|eResearcher |
| 245 | __ | |aDeposition and characterization of high k dielectric thin films for mos capacitors |
| 260 | __ | |aJalgaon|bNorth Maharashtra University |
| 502 | __ | |bPhD |
| 700 | __ | |aMahajan, A M|eGuide |
| 856 | __ | |uhttp://shodhganga.inflibnet.ac.in/handle/10603/148898|yShodhganga |
| 905 | __ | |anotification |
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