| Type of Material: | Thesis |
| Title: | Performance enhancement of double gate mosfets in sub micron technology using high K dielectric |
| Researcher: | Flavia Princess Nesamani, I. |
| Guide: | Lakshmi Prabha, V. |
| Publisher: | Anna University |
| Place: | Chennai |
| Language: | English |
| Dissertation/Thesis Note: | PhD |
| Fulltext: | Shodhganga |
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| 001 | 379922 | |
| 003 | IN-AhILN | |
| 005 | 2018-08-14 08:46:11 | |
| 008 | __ | 180814t####||||ii#||||g|m||||||||||eng|| |
| 035 | __ | |a(IN-AhILN)th_379922 |
| 040 | __ | |aANNA_600025|dIN-AhILN |
| 041 | __ | |aeng |
| 100 | __ | |aFlavia Princess Nesamani, I.|eResearcher |
| 245 | __ | |aPerformance enhancement of double gate mosfets in sub micron technology using high K dielectric |
| 260 | __ | |aChennai|bAnna University |
| 502 | __ | |bPhD |
| 700 | __ | |aLakshmi Prabha, V.|eGuide |
| 856 | __ | |uhttp://shodhganga.inflibnet.ac.in/handle/10603/141119|yShodhganga |
| 905 | __ | |anotification |
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