| Type of Material: | Thesis |
| Title: | Simulation of energetic electron beam interaction with resist on semiconductor substrates using Monte Carlo process and its application to e_beam lithography |
| Researcher: | Singh, Moirangthem Shubhakanta |
| Guide: | Indrajit Sharma, B and Khatri |
| Publisher: | Assam University |
| Place: | Silchar |
| Language: | English |
| Dissertation/Thesis Note: | PhD |
| Fulltext: | Shodhganga |
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| 001 | 340393 | |
| 003 | IN-AhILN | |
| 005 | 2018-08-14 05:43:31 | |
| 008 | __ | 180814t####||||ii#||||g|m||||||||||eng|| |
| 035 | __ | |a(IN-AhILN)th_340393 |
| 040 | __ | |aASUS_788001|dIN-AhILN |
| 041 | __ | |aeng |
| 100 | __ | |aSingh, Moirangthem Shubhakanta|eResearcher |
| 245 | __ | |aSimulation of energetic electron beam interaction with resist on semiconductor substrates using Monte Carlo process and its application to e_beam lithography |
| 260 | __ | |aSilchar|bAssam University |
| 502 | __ | |bPhD |
| 700 | __ | |aIndrajit Sharma, B and Khatri|eGuide |
| 856 | __ | |uhttp://shodhganga.inflibnet.ac.in/handle/10603/92988|yShodhganga |
| 905 | __ | |anotification |
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