Type of Material: | Thesis |
Title: | Effects of Process variation on the performance parameters of VLSI interconnects |
Researcher: | K.G Verma |
Guide: | Kaushik, B.K.;Singh |
Publisher: | Shobhit University |
Place: | Meerut |
Year: | 2015-05-05 |
Language: | English |
Dissertation/Thesis Note: | PhD |
Fulltext: | Shodhganga |
000 | 00000ntm a2200000ua 4500 | |
001 | 297724 | |
003 | IN-AhILN | |
005 | 2018-08-14 02:28:44 | |
008 | __ | 180814t2015||||ii#||||g|m||||||||||eng|| |
035 | __ | |a(IN-AhILN)th_297724 |
040 | __ | |aSHOB_250110|dIN-AhILN |
041 | __ | |aeng |
100 | __ | |aK.G Verma|eResearcher |
245 | __ | |aEffects of Process variation on the performance parameters of VLSI interconnects |
260 | __ | |aMeerut|bShobhit University|c2015-05-05 |
502 | __ | |bPhD |
700 | __ | |aKaushik, B.K.;Singh|eGuide |
856 | __ | |uhttp://shodhganga.inflibnet.ac.in/handle/10603/40032|yShodhganga |
905 | __ | |anotification |
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