Type of Material: | Thesis |
Title: | High-k gate dielectric-based metal-oxide-semiconductor (MOS) devices |
Researcher: | Biswas, Debaleen |
Guide: | Chakraborty, Supratic |
Department: | Faculty of Science |
Publisher: | University of Calcutta, Kolkata |
Place: | Kolkata |
Year: | 09/11/2017 |
Language: | English |
Subject: | Oxide | Dielectric |
Dissertation/Thesis Note: | PhD |
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100 | __ | |aBiswas, Debaleen|eResearcher |
110 | __ | |aFaculty of Science|bUniversity of Calcutta, Kolkata|dKolkata |
245 | __ | |aHigh-k gate dielectric-based metal-oxide-semiconductor (MOS) devices |
260 | __ | |aKolkata|bUniversity of Calcutta, Kolkata|c09/11/2017 |
502 | __ | |bPhD |
653 | __ | |aOxide |
653 | __ | |aDielectric |
700 | __ | |aChakraborty, Supratic|eGuide |
905 | __ | |anotification |
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