Type of Material: | Thesis |
Title: | Effects of process variations on the performance parameters of VLSI interconnects |
Researcher: | Verma, K G |
Guide: | Singh, Raghuvir | Kaushik, B K |
Department: | Department of Electronics |
Publisher: | Shobhit University |
Place: | Meerut |
Year: | 2012 |
Language: | English |
Subject: | Electronics | Electronic engineering | VLSI interconnects |
Dissertation/Thesis Note: | PhD |
000 | 00000ntm a2200000ua 4500 | |
001 | 252738 | |
003 | IN-AhILN | |
005 | 2013-01-03 02:50:28 | |
008 | __ | 130103t2012||||ii#||||g|m||||||||||eng|| |
035 | __ | |a(IN-AhILN)th_252738 |
040 | __ | |aSHOB_250110|dIN-AhILN |
041 | __ | |aeng |
100 | __ | |aVerma, K G|eResearcher |
110 | __ | |aDepartment of Electronics|bShobhit University|dMeerut |
245 | __ | |aEffects of process variations on the performance parameters of VLSI interconnects |
260 | __ | |aMeerut|bShobhit University|c2012 |
502 | __ | |bPhD |
653 | __ | |aElectronics |
653 | __ | |aElectronic engineering |
653 | __ | |aVLSI interconnects |
700 | __ | |aSingh, Raghuvir|eGuide |
700 | __ | |aKaushik, B K|eGuide |
905 | __ | |anotification |
User Feedback Comes Under This section.