| Type of Material: | Thesis |
| Title: | Investigation on inductively coupled plasma interaction with compound semiconductor materials for etching applications |
| Researcher: | Rawal, Dipendra Singh |
| Guide: | Malik, Hitendra K |
| Department: | Department of Physics |
| Publisher: | Indian Institute of Technology Delhi |
| Place: | New Delhi |
| Year: | 2012 |
| Language: | English |
| Subject: | Physics | Physical science | Physics |
| Dissertation/Thesis Note: | PhD |
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| 001 | 252553 | |
| 003 | IN-AhILN | |
| 005 | 2012-12-27 12:03:06 | |
| 008 | __ | 121227t2012||||ii#||||g|m||||||||||eng|| |
| 035 | __ | |a(IN-AhILN)th_252553 |
| 040 | __ | |aIITD_110016|dIN-AhILN |
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| 100 | __ | |aRawal, Dipendra Singh|eResearcher |
| 110 | __ | |aDepartment of Physics|bIndian Institute of Technology Delhi|dNew Delhi |
| 245 | __ | |aInvestigation on inductively coupled plasma interaction with compound semiconductor materials for etching applications |
| 260 | __ | |aNew Delhi|bIndian Institute of Technology Delhi|c2012 |
| 502 | __ | |bPhD |
| 650 | __ | |aPhysics|2UGC |
| 653 | __ | |aPhysics |
| 653 | __ | |aPhysical science |
| 700 | __ | |aMalik, Hitendra K|eGuide |
| 905 | __ | |anotification |
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