Title : Studies of device parameters of nanoscale double gate Si and Ge MOSFETs

Type of Material: Thesis
Title: Studies of device parameters of nanoscale double gate Si and Ge MOSFETs
Researcher: Bhattacharjee, Swagata
Guide: Biswas, Abhijit
Basu, P K
Department: Department of Radio Physics & Electronics
Publisher: University of Calcutta
Place: Kolkata
Year: 2012
Language: English
Subject: Electronics engineering
Communication engineering
Radio physics
Electronics
Dissertation/Thesis Note: PhD
Fulltext: Shodhganga

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035__|a(IN-AhILN)th_251296
040__|aCLCT_700073|dIN-AhILN
041__|aeng
100__|aBhattacharjee, Swagata|eResearcher
110__|aDepartment of Radio Physics & Electronics|bUniversity of Calcutta|dKolkata
245__|aStudies of device parameters of nanoscale double gate Si and Ge MOSFETs
260__|aKolkata|bUniversity of Calcutta|c2012
502__|bPhD
653__|aElectronics engineering
653__|aCommunication engineering
653__|aRadio physics
653__|aElectronics
700__|aBiswas, Abhijit|eGuide
700__|aBasu, P K|eGuide
856__|uhttp://shodhganga.inflibnet.ac.in/handle/10603/162903|yShodhganga
905__|anotification

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