| Type of Material: | Thesis |
| Title: | Characterrization of thin films of amorphous silicon nitride prepared by plasma enhanced chemical vapour deposition technique |
| Researcher: | Gupta, Manju |
| Guide: | Agnihotri, O P | Sehgal, H K |
| Department: | Department of Physics |
| Publisher: | Indian Institute of Technology-Delhi |
| Place: | New Delhi |
| Year: | 1994 |
| Language: | English |
| Subject: | Physical Sciences | Physics | Physics |
| Dissertation/Thesis Note: | PhD |
| 000 | 00000ntm a2200000ua 4500 | |
| 001 | 159254 | |
| 003 | IN-AhILN | |
| 005 | 2011-01-13 00:00:00 | |
| 008 | __ | 941231t1994||||ii#||||g|m||||||||||eng|| |
| 035 | __ | |a(IN-AhILN)th_159254 |
| 040 | __ | |aIITD_110016|dIN-AhILN |
| 041 | __ | |aeng |
| 100 | __ | |aGupta, Manju|eResearcher |
| 110 | __ | |aDepartment of Physics|bIndian Institute of Technology-Delhi|dNew Delhi|eIn |
| 245 | __ | |aCharacterrization of thin films of amorphous silicon nitride prepared by plasma enhanced chemical vapour deposition technique |
| 260 | __ | |aNew Delhi|bIndian Institute of Technology-Delhi|c1994 |
| 502 | __ | |bPhD |
| 650 | __ | |aPhysics|2UGC |
| 653 | __ | |aPhysical Sciences |
| 653 | __ | |aPhysics |
| 700 | __ | |aAgnihotri, O P|eGuide |
| 700 | __ | |aSehgal, H K|eGuide |
| 905 | __ | |anotification |
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