| Type of Material: | Thesis |
| Title: | Ion assisted deposition of oxide thin films |
| Researcher: | Krishna, M G |
| Department: | Department of Engineering |
| Publisher: | Indian Institute of Science |
| Place: | Bangalore |
| Year: | 1992 |
| Language: | English |
| Subject: | Physical Sciences | Engineering and Technology |
| Dissertation/Thesis Note: | PhD |
| 000 | 00000ntm a2200000ua 4500 | |
| 001 | 158321 | |
| 003 | IN-AhILN | |
| 005 | 2011-01-13 00:00:00 | |
| 008 | __ | 921231t1992||||ii#||||g|m||||||||||eng|| |
| 035 | __ | |a(IN-AhILN)th_158321 |
| 040 | __ | |aIISC_560012|dIN-AhILN |
| 041 | __ | |aeng |
| 100 | __ | |aKrishna, M G|eResearcher |
| 110 | __ | |aDepartment of Engineering|bIndian Institute of Science|dBangalore|eIn |
| 245 | __ | |aIon assisted deposition of oxide thin films |
| 260 | __ | |aBangalore|bIndian Institute of Science|c1992 |
| 502 | __ | |bPhD |
| 653 | __ | |aPhysical Sciences |
| 653 | __ | |aEngineering and Technology |
| 905 | __ | |anotification |
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