| Type of Material: | Thesis |
| Title: | Plasma processing in photoresist stripping silicon wafer cleaning and oxide deposition |
| Researcher: | Chanana, Ravi Kumar |
| Department: | Department of Electronics Engineering |
| Publisher: | Banaras Hindu University |
| Place: | Varanasi |
| Year: | 1992 |
| Language: | English |
| Subject: | Electronics Engineering | Surface Physics |
| Accession No: | 790617%790618 |
| Dissertation/Thesis Note: | PhD |
| 000 | 00000ntm a2200000ua 4500 | |
| 001 | 140191 | |
| 003 | IN-AhILN | |
| 005 | 2011-01-13 00:00:00 | |
| 008 | __ | 921231t1992||||ii#||||g|m||||||||||eng|| |
| 035 | __ | |a(IN-AhILN)th_140191 |
| 040 | __ | |aBHUL_221005|dIN-AhILN |
| 041 | __ | |aeng |
| 100 | __ | |aChanana, Ravi Kumar|eResearcher |
| 110 | __ | |aDepartment of Electronics Engineering|bBanaras Hindu University|dVaranasi|eIN |
| 245 | __ | |aPlasma processing in photoresist stripping silicon wafer cleaning and oxide deposition |
| 260 | __ | |aVaranasi|bBanaras Hindu University|c1992 |
| 502 | __ | |bPhD |
| 653 | __ | |aElectronics Engineering |
| 653 | __ | |aSurface Physics |
| 852 | __ | |p790617%790618 |
| 905 | __ | |anotification |
User Feedback Comes Under This section.