Type of Material: | Thesis |
Title: | Study of interface states in Si-SiO2 systems grown by different oxidation techniques |
Researcher: | Duggirala, Krishna Rao |
Guide: | Majhi, J |
Department: | Department of Physics |
Publisher: | Indian Institute of Technology-madras |
Place: | Chennai |
Year: | 1985 |
Language: | English |
Subject: | Physics | States Of Matter | Physics |
Dissertation/Thesis Note: | PhD |
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001 | 111255 | |
003 | IN-AhILN | |
005 | 2011-01-13 00:00:00 | |
008 | __ | 851231t1985||||ii#||||g|m||||||||||eng|| |
035 | __ | |a(IN-AhILN)th_111255 |
040 | __ | |aIITM_600036|dIN-AhILN |
041 | __ | |aeng |
100 | __ | |aDuggirala, Krishna Rao|eResearcher |
110 | __ | |aDepartment of Physics|bIndian Institute of Technology-madras|dChennai|eIn |
245 | __ | |aStudy of interface states in Si-SiO2 systems grown by different oxidation techniques |
260 | __ | |aChennai|bIndian Institute of Technology-madras|c1985 |
502 | __ | |bPhD |
650 | __ | |aPhysics|2UGC |
653 | __ | |aPhysics |
653 | __ | |aStates Of Matter |
700 | __ | |aMajhi, J|eGuide |
905 | __ | |anotification |
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